Equipment Information

Beneq TFS200 Plasma ALD System · Atomic Layer Deposition

  • Internal Name: ALD1

Description

Please enquire about deposition of TiO2, TiN, Ta2O5, Al2O3, ZnO, SiO2, SiN, NiO, ITO, MoO.

Process Type(s)

Physical Vapour Deposition

ALD1 image

← Back to Equipment List