Durham Magneto Optics Microwriter ML3

A direct-write photolithography tool. Key features include: Software-based mask definition 385nm LED lightsource – suitable for broadband, g-, h- and i-line positive and negative photoresists Wafers up to 230mm diameter; no minimum wafer size; multiple wafer handling Up to 195mm diameter writing area with automatic height compensation 0.6µm, 1µm, 2µm and 5µm minimum feature sizes across full writing area Writing speed up to: 17mm2/minute (at 0.6µm); 180mm2/minute (at 5µm) Manual alignment and virtual mask alignment functionality 2D optical profiler with 100nm resolution Automatic wafer/die inspection See Microwriter ML3 Pro product sheet for full spec.