Equipment Information
Raith EBPG5200+ · Electron Beam Pattern Generator
- Internal Name: EBPG
Description
The EBPG5200plus is a 100kV ultra-high-performance electron beam lithography system suitable for nanoscale writing at frequencies up to 125MHz. Capable of patterning small tiles and full wafers (up to 200mm) with a maximum main-field size of 1mm and a BSE detector for top-side alignment.
Process Type(s)
Electron Beam Lithography
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