Raith EBPG5200+

Electron Beam Pattern Generator
Internal name
EBPG
Process types
Electron Beam Lithography
Description
The EBPG5200plus is a 100kV ultra-high-performance electron beam lithography system suitable for nanoscale writing at frequencies up to 125MHz. Capable of patterning small tiles and full wafers (up to 200mm) with a maximum main-field size of 1mm and a BSE detector for top-side alignment.
EBPG image