Lesker PROLine200

Metal Evaporator and Sputter Coater
Bank holiday 25 Dec Bay 12A Translational Research Hub
Internal name
EVAP04
Equipment managers
Rini Lahiri
Saleem Shabbir
Process types
Physical Vapour Deposition
Description
Open-chamber PVD system suitable for samples up to 200mm wafer size (at request), with thermal, e-beam and sputter capabilities. Able to evaporate the following materials using e-beam evaporation: Titanium, Aluminium, Platinum, Nickel, Chromium, Germanium Able to evaporate the following materials using thermal evaporation: Gold/Germanium, Gold (short, medium or long throw), Silver. Able to evaporate the following materials using sputtering: Aluminium, Titanium, Nickel/Chrome, Gold, Niobium, ITO, IGZO Requires time to pump the sample down from atmosphere before the sample is ready for deposition - allow 3 hours. Please ensure you inform ICS staff of the required materials to be deposited before you are ready to load your sample (use notes section of booking).
EVAP04 image