Equipment Information

• Internal Name: EVAP08

Description

Open chamber PVD system, suitable for samples up to 150mm wafer size, with sputter capabilities. Able to evaporate the following materials using sputtering: Aluminium, Titanium, Niobium, Nickel/Chrome, Gold, Platinum. Please inform ICS staff in advance of the required materials, to ensure that we have the correct sputter head(s) installed (use notes section of booking). Sample loading will require 2 hours of pumping, so prepare sample in advance.