Moorfield Nanotechnology Minilab S060M

Metal Sputter Coater
Internal name
EVAP08
Process types
Physical Vapour Deposition
Description
Open chamber PVD system, suitable for samples up to 150mm wafer size, with sputter capabilities. Able to evaporate the following materials using sputtering: Aluminium, Titanium, Niobium, Nickel/Chrome, Gold, Platinum. Please inform ICS staff in advance of the required materials, to ensure that we have the correct sputter head(s) installed (use notes section of booking). Sample loading will require 2 hours of pumping, so prepare sample in advance.
EVAP08 image