Process types
Physical Vapour Deposition
Description
Open chamber PVD system, suitable for samples up to 150mm wafer size, with sputter capabilities.
Able to evaporate the following materials using sputtering: Aluminium, Titanium, Niobium, Nickel/Chrome, Gold, Platinum.
Please inform ICS staff in advance of the required materials, to ensure that we have the correct sputter head(s) installed (use notes section of booking). Sample loading will require 2 hours of pumping, so prepare sample in advance.