The ThermoFisher Scientific Helios 5 FIB-SEM uses a Liquid Metal Ion Source (LMIS) of Gallium to deliver a focused ion beam for, nanoscale milling, cross-sectioning, and material deposition on semiconductor samples with a high resolution electron microscope for in-situ imaging and beam alignment. Depositable materials include Pt, W, C and SiOx as well as XeF staining/etching. The system is also capable of nanomanipulation for controlled lamella lift out for transmission microscopy.
Metrology