Bank holiday 25 Dec
Bay 10 Translational Research Hub
Internal name
ICP3/DET04
Equipment managers
Elizabeth Beaumont
Stuart Thomas
Process types
Plasma Etch and Deposition
Description
The SPTS Omega ICP process module is highly flexible and etches a wide range of materials including GaAs, GaN, SiN, oxides, polymers, low aspect ratio Si and metals. It uses a high-density plasma source with a radial coil design, used for RF, photonics and optoelectronics devices. Laser endpoint detection is fitted and process gases include Ar, O2, H2, He, N2, Cl2, SF6 and BCl3.
