Process types
Plasma Etch and Deposition
Description
The SPTS Omega® ICP process module is highly flexible and etches a wide range of materials including GaAs, GaN, SiN, oxides, polymers, low aspect ratio Si and metals. The SPTS ICP process module uses a high-density plasma source incorporating a radial coil design. Used in applications for RF devices and photonics/optoelectronics devices, the ICP process module is an enabling tool for the semiconductor industry.
It has a laser endpoint detection system and process gases include Ar, O2, H2, He, N2, Cl2, SF6 and BCl3.