SUSS MicroTec MA08 Gen4 Mask Aligner

Mask Aligner
Bank holiday 25 Dec Bay 04 Translational Research Hub
Internal name
MA08
Equipment managers
Tyrone Jones
Michael Lewis
Process types
Optical Lithography
Description
Semi-automated mask and bond aligner with diffraction-reducing optics. UV-LED array: 365nm (i-line), 405nm (h-line), 436nm (g-line) Mask sizes: 100mm, 150mm, 200mm Wafer sizes: 100mm, 150mm, 200mm Top-side, bottom-side and infrared alignment. DirectAlign® allows for 0.5µm alignment (0.25µm with COGNEX® pattern recognition) Proximity lithography and soft/hard/vacuum contact exposure Resolution down to sub-micron scale Wedge error correction with micrometric precision
MA08 image