Process types
Optical Lithography
Description
Semi-automated mask and bond aligner with diffraction-reducing optics.
UV-LED array: 365nm (i-line), 405nm (h-line), 436nm (g-line)
Mask sizes: 100mm, 150mm, 200mm
Wafer sizes: 100mm, 150mm, 200mm
Top-side, bottom-side and infrared alignment. DirectAlign® allows for 0.5µm alignment (0.25µm with COGNEX® pattern recognition)
Proximity lithography and soft/hard/vacuum contact exposure
Resolution down to sub-micron scale
Wedge error correction with micrometric precision