Equipment Information

SUSS MicroTec MCS8 · Resist Spin Coater

  • Internal Name: MCS8 RCD8 Spinner & HP8 3.1

Description

A modular system for photoresist coating of wafers, featuring the following components: RCD8 semi-automated spin coater: Standard wafers up to 200mm; square substrates up to 150mm x 150mm Edge bead removal and back-side rinse functionality Automated dispense options and programmable recipes   HP8 200mm hotplate (x2): Quickstart and programmable recipe options Homogeneous temperature distribution Optional nitrogen environment and hotplate vacuum   VP8 Vapour Primer: Programmable surface conditioner for application of HDMS

Process Type(s)

Resist Coat and Develop

MCS8 RCD8 Spinner & HP8 3.1 image

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