SUSS MicroTec MJB4 Manual Mask Aligner

Mask Aligner

Bank holiday 25 Dec Bay 04 Translational Research Hub

Internal name

MJB4

Equipment managers

Tyrone Jones

Michael Lewis

Process types

Optical Lithography

Description

Manual contact mask aligner for photolithography on small substrates and pieces, from 5 x 5mm up to 100mm diameter. Supports soft, hard and vacuum contact plus proximity (gap) exposure, resolving features below 0.5um. Optional infrared alignment allows backside registration through IR-transparent substrates such as GaAs, InP and silicon.