SUSS MicroTec Labspin

Resist Spin Coater

Bank holiday 25 Dec Bay 05 Translational Research Hub

Internal name

SuSS Labspin

Equipment managers

Tyrone Jones

Michael Lewis

Process types

Resist Coat and Develop

Description

Compact manual spin coater and developer from SUSS MicroTec (LabSpin series) for laboratory and R&D photolithography. Handles round substrates up to 150mm and forms resist layers from below 1um to several hundred um, applied by syringe or optional automatic dispense, and also supports puddle developing, edge-bead removal and edge coating.