Equipment Information

• Internal Name: WetOx1

Description

For the controlled oxidation of AlGaAs/AlAs layers in the fabrication of Vertical Cavity Surface Emitting Lasers (VCSELs) and other devices with similar material systems: Small samples up to 200mm diameter wafers Stabilized process temperatures from 350°C to 600°C Tight flow control of moisturized gas from 0.6 to 30 g/h Process vacuum atmosphere from 10 to 800 mbar In situ monitoring of oxidation using infra-red microscope Full programming for bespoke recipes